Recently, Yuangui Materials completed a new round of financing of hundreds of millions of yuan, led by Gao Lin Venture Capital, with the participation of Shenzhen Venture Capital and Kunshan Guoke. The funds will be used to expand the production capacity of its “Source Exhibition Materials” in the field of precursors for atomic layer deposition and develop new products. These materials are key raw materials for chip thin film deposition processes. According to Tianyan Research, the patent for “a preparation method for the ALD precursor lanthanum complex” applied for by Suzhou Yuanzhan Material Technology Co., Ltd., a subsidiary of Shanghai Yuangui Material Technology Co., Ltd., was announced on August 21 this year and is currently in the substantive review stage. Abstract As recorded, this method reduces dimer impurities in the final product through a multi-step reaction and prepares a high-purity lanthanum complex.

Recently, Yuangui Materials completed a new round of financing of hundreds of millions of yuan, led by Gao Lin Venture Capital, with the participation of Shenzhen Venture Capital and Kunshan Guoke. The funds will be used to expand the production capacity of its “Source Exhibition Materials” in the field of precursors for atomic layer deposition and develop new products. These materials are key raw materials for chip thin film deposition processes. According to Tianyan Research, the patent for “a preparation method for the ALD precursor lanthanum complex” applied for by Suzhou Yuanzhan Material Technology Co., Ltd., a subsidiary of Shanghai Yuangui Material Technology Co., Ltd. was announced on August 21 this year and is currently in the substantive review stage. Abstract As recorded, this method reduces dimer impurities in the final product through a multi-step reaction and prepares a high-purity lanthanum complex.