At the 8th Expo, semiconductor equipment supplier ASML showcased some of its panoramic lithography products and technologies. Among them, DUV lithographs include TWINSCAN XT: 260 and TWINSCAN NXT: 870B. The reporter learned that the TWINSCAN XT: 260 is ASML's first lithography system that can serve the field of advanced packaging. It has a large field of view and exposure, which can increase production efficiency by 4 times compared to existing models; the TWINSCAN NXT:870B can produce more than 400 wafers per hour with the support of upgraded optical devices and the latest generation of maglev platforms.

At the 8th Expo, semiconductor equipment supplier ASML showcased some of its panoramic lithography products and technologies. Among them, DUV lithographs include TWINSCAN XT: 260 and TWINSCAN NXT: 870B. The reporter learned that the TWINSCAN XT: 260 is ASML's first lithography system that can serve the field of advanced packaging. It has a large field of view and exposure, which can increase production efficiency by 4 times compared to existing models; the TWINSCAN NXT:870B can produce more than 400 wafers per hour with the support of upgraded optical devices and the latest generation of maglev platforms.