According to today's news from “Optics Valley of China”, Optics Valley companies have recently achieved a major breakthrough in the field of semiconductor-specific photoresists: the T150 A photoresist product launched by Wuhan Taiziwei Optoelectronics Technology Co., Ltd. has passed the semiconductor process mass production verification, and has achieved a completely independent design of the formula, which is expected to create a new situation in domestic semiconductor lithography manufacturing. This product is based on the mainstream KrF photoresist series of leading international companies. Compared with the UV1610 in the same series of foreign products known as “monster gum” in the industry, the T150 A shows an ultimate resolution of 120 nm in the lithography process, and has greater process tolerance, higher stability, excellent post-film baking rate, and is more friendly to the post-etching process. Through verification, it was found that the intensive pattern in the T150 A has been etched, and the sidewall verticality of the underlying medium is excellent.

According to today's news from “Optics Valley of China”, Optics Valley companies have recently achieved a major breakthrough in the field of semiconductor-specific photoresists: the T150 A photoresist product launched by Wuhan Taiziwei Optoelectronics Technology Co., Ltd. has passed the semiconductor process mass production verification, and has achieved a completely independent design of the formula, which is expected to create a new situation in domestic semiconductor lithography manufacturing. This product is based on the mainstream KrF photoresist series of leading international companies. Compared with the UV1610 in the same series of foreign products known as “monster gum” in the industry, the T150 A shows an ultimate resolution of 120 nm in the lithography process, and has greater process tolerance, higher stability, excellent post-film baking rate, and is more friendly to the post-etching process. Through verification, it was found that the intensive pattern in the T150 A has been etched, and the sidewall verticality of the underlying medium is excellent.