MARKET

ATOM

ATOM

Atomera Inc
NASDAQ
8.41
+0.31
+3.83%
After Hours: 8.48 +0.07 +0.83% 19:52 05/08 EDT
OPEN
8.22
PREV CLOSE
8.10
HIGH
8.52
LOW
7.74
VOLUME
1.40M
TURNOVER
--
52 WEEK HIGH
11.48
52 WEEK LOW
1.892
MARKET CAP
325.61M
P/E (TTM)
-12.8574
1D
5D
1M
3M
1Y
5Y
1D
Atomera’s 2025 Risk Profile Remains Unchanged, but Investors Should Watch for Emerging Threats
TipRanks · 3d ago
Atomera Earnings Call: Technical Wins, Revenue Lags
TipRanks · 3d ago
The Market Is Discovering The Industrial Supply Chain Of AI
Seeking Alpha · 3d ago
Atomera Shares Drop After Lower 1Q Revenue, Wider Loss
Dow Jones · 4d ago
12 Information Technology Stocks Moving In Wednesday's Pre-Market Session
Benzinga · 4d ago
Upstart Posts Downbeat Q1 Earnings, Joins Wolfspeed, Arista Networks And Other Big Stocks Moving Lower In Wednesday's Pre-Market Session
Benzinga · 4d ago
Why Veeco Instruments Shares Are Trading Higher By 21%; Here Are 20 Stocks Moving Premarket
Benzinga · 4d ago
Analysts Offer Insights on Technology Companies: Atomera (ATOM) and Infineon Technologies AG (OtherIFNNF)
TipRanks · 4d ago
More
About ATOM
Atomera Incorporated is engaged in the business of developing, commercializing and licensing processes and technologies for the semiconductor industry. The Company’s lead technology, named Mears Silicon Technology (MST) is a thin film of reengineered silicon, typically 100 to 300 angstroms (approximately 20 to 60 silicon atomic unit cells) thick. MST consists of layers of a non-semiconductor, such as oxygen, inserted into a semiconductor material, such as silicon, so that epitaxial growth is preserved. These layers can be used to modify or enhance the basic semiconductor properties and device attributes in a number of ways, including diffusion blocking, variability, mobility, gate leakage, and reliability, among others. MST can be used to create doping profiles. Its MSTcad is a Mathematical Model for the Synopsys Sentaurus Device Platform. MSTcad is available for Sentaurus Process and Device simulation packages, for physical and electrical characterization.

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